Microstructural characterization of BaTiO3 thin films prepared by RF-Magnetron sputtering using sintered targets from high energy ball milled powders The electronic and optical characteristics of ...

Targets of BaTiO 3 (BT) (50 mm diameter) were prepared starting from BT-commercial powders (99.9%) and particle size of 2 µm, previously dry milled by high energy process (SPEX 8000 mixer mill). The ...

Sputtering Technique Sputtering is a process wherein a controlled gas, typically chemically inert argon, is introduced into a vacuum chamber and then a cathode is electrically energized to generate a ...