Innovative RF-magnetron sputtering process creates homogenous BaTiO3 films for high-tech electronics
Microstructural characterization of BaTiO3 thin films prepared by RF-Magnetron sputtering using sintered targets from high energy ball milled powders The electronic and optical characteristics of ...
Targets of BaTiO 3 (BT) (50 mm diameter) were prepared starting from BT-commercial powders (99.9%) and particle size of 2 µm, previously dry milled by high energy process (SPEX 8000 mixer mill). The ...
On the other hand, RF power is also capable of sputtering non conductive materials. Pulsed DC is suitable for some techniques such as reactive sputtering. Reactive Sputtering Reactive sputtering ...
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